Polishing Slurry

Superior surface finish of optical components

We produce polishing slurries for the surface finishing of various materials. By using these slurries in your polishing process, you will achieve superior flatness, material removal rate and surface quality.

These slurries with evenly dispersed grit are very stable and offer a long-time use.

Typ XC-7

Colloidal silica polishing slurry for polishing of materials such as sapphire, silicon, YAG and calcium fluoride.
Particle size: 7 – 10 nm

Typ XC-35 / XC-40

Colloidal silica polishing slurry for polishing materials such as sapphire, silicon, YAG and calcium fluoride.
Particle size: XC-35: 50 nm
Particle size: XC-40: 90 nm

Typ PMI-2

Polishing slurry made of rare earths (Ce) for the surface finishing of glass.

Other types

We also produce other slurries for materials such as sapphire, silicon carbide and other ultra-hard carbides and nitrides. We would be pleased to determine the right solution for your needs.

Benefits of dopa polishing slurries

Gives a perfect surface finish and eliminates any subsurface damage of your parts
High material removal rate (MRR)
Excellent part flatness and TTV of your parts
Compatible with all common hard and medium-hard PU-pads and suede-type polishing pads.
Keeps the removal rate stable to ensure better process control
Stable slurry with long lifetime